Characterization of the gray-scale photolithography with high-resolution gray steps for the precise fabrication of diffractive optics

被引：18

作者：

Lu, YT ^{[1
]}

Chu, CS ^{[1
]}

Lin, HY ^{[1
]}

机构：

[1] Ind Technol Res Inst, Optoelect & Syst Labs, Chutung 310, Taiwan

来源：

OPTICAL ENGINEERING | 2004年 / 43卷 / 11期

关键词：

gray-scale lithography; high-energy-beam-sensitive glass; diffractive optical element;

D O I：

10.1117/1.1801411

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

To fabricate a diffractive optical element (DOE) with optimum surface profile, we characterize the relation between the developed height profile on the photoresist and the optical density (OD) value of a high-energy-beam-sensitive (HEBS) gray-scale photomask with high-resolution gray steps. The lithography characteristics of a gray step less than 10 mum are inspected in detail. The gray patterns with various gray-step widths are fabricated for the investigation of the relation between the OD values and the height profiles on the specific photoresist. We demonstrate the dependence of the photoresist height profiles on the width of the gray step, and this dependence agrees well with the simulation results from our model. We provide a proper method to design the OD value of a gray-scale photomask for the fabrication of DOEs with precise surface profiles.

引用

页码：2666 / 2670

页数：5

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