Solder bonding for microelectromechanical systems (MEMS) applications

被引:3
作者
Goyal, A [1 ]
Tadigadapa, S [1 ]
Islam, R [1 ]
机构
[1] Penn State Univ, Dept Elect Engn, University Pk, PA 16802 USA
来源
RELIABILITY, TESTING, AND CHARACTERIZATION OF MEMS/MOEMS II | 2003年 / 4980卷
关键词
MEMS; eutectic bonding; packaging; solder bonding;
D O I
10.1117/12.478202
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
MEMS fabrication and packaging requires a bonding technology that is universal for all substrates, has high resolution, requires relatively lower temperatures, is reliable and is low cost to implement. The bonding technology presented meets the above standards. The process is substrate independent and involves aligned bonding of two similarly patterned wafers using tin solder as the bonding material. The technique can be used for whole wafer or selected area bonding. The resolution of this technique is only limited by the resolution that can be achieved in the patterning and delineation of the seed metal.
引用
收藏
页码:281 / 288
页数:8
相关论文
共 24 条
[1]   Design of a modular micropump based on anodic bonding [J].
Acero, MC ;
Plaza, JA ;
Esteve, J ;
Carmona, M ;
Marco, S ;
Samitier, J .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1997, 7 (03) :179-182
[2]   ANODIC BONDING OF IMPERFECT SURFACES [J].
ANTHONY, TR .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2419-2428
[3]  
BENGTSSON S, 1992, J ELECTRON MATER, V21, P841
[4]  
BEVER MB, 1986, ENCY MAT SCI ENG, V7, P5070
[5]  
CHU Z, 1995, TRANSDUCERS 95 EUROS, V9, P656
[6]  
ESASHI M, 1992, MICRO ELECT MECH SYS, P43
[7]   SILICON-ON-INSULATOR WAFER BONDING-WAFER THINNING TECHNOLOGICAL EVALUATIONS [J].
HAISMA, J ;
SPIERINGS, GACM ;
BIERMANN, UKP ;
PALS, JA .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (08) :1426-1443
[8]  
HUMPSTON G, 1997, IEE COLL ASSEMBLY CO, P1
[9]   THE MECHANISM OF FIELD-ASSISTED SILICON GLASS BONDING [J].
KANDA, Y ;
MATSUDA, K ;
MURAYAMA, C ;
SUGAYA, J .
SENSORS AND ACTUATORS A-PHYSICAL, 1990, 23 (1-3) :939-943
[10]  
Ko W. H., 1985, MICROMACHINING MICRO, P41