Fabrication and characterization of high-temperature microreactors with thin film heater and sensor patterns in silicon nitride tubes

被引:38
作者
Tiggelaar, RM
Berenschot, JW
de Boer, JH
Sanders, RGP
Gardeniers, JGE
Oosterbroek, RE
van den Berg, A
Elwenspoek, MC
机构
[1] Univ Twente, MESA Res Inst, Sci Technol Grp, NL-7500 AE Enschede, Netherlands
[2] Univ Twente, MESA Res Inst, BIOS Lab Chip Grp, NL-7500 AE Enschede, Netherlands
关键词
D O I
10.1039/b414857f
中图分类号
Q5 [生物化学];
学科分类号
071010 ; 081704 ;
摘要
In this paper the fabrication and electrical characterization of a silicon microreactor for high-temperature catalytic gas phase reactions, like Rh-catalyzed catalytic partial oxidation of methane into synthesis gas, is presented. The microreactor, realized with micromachining technologies, contains silicon nitride tubes that are suspended in a flow channel. These tubes contain metal thin films that heat the gas mixture in the channel and sense its temperature. The metal patterns are defined by using the channel geometry as a shadow mask. Furthermore, a new method to obtain Pt thin films with good adhesive properties, also at elevated temperatures, without adhesion metal is implemented in the fabrication process. Based on different experiments, it is concluded that the electrical behaviour at high temperatures of Pt thin films without adhesion layer is better than that of Pt/Ta films. Furthermore, it is found that the temperature coefficient of resistance (TCR) and the resistivity of the thin films are stable for up to tens of hours when the temperature-range during operation of the microreactor is below the so-called 'burn-in' temperature. Experiments showed that the presented suspended-tube microreactors with heaters and temperature sensors of Pt thin films can be operated safely and in a stable way at temperatures up to 700 degreesC for over 20 h. This type of microreactor solves the electrical breakdown problem that was previously reported by us in flat-membrane microreactors that were operated at temperatures above 600 degreesC.
引用
收藏
页码:326 / 336
页数:11
相关论文
共 42 条
  • [21] A microreactor for hydrogen production in micro fuel cell applications
    Pattekar, AV
    Kothare, MV
    [J]. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2004, 13 (01) : 7 - 18
  • [22] A glass/silicon technology for low-power robust gas sensors
    Plaza, JA
    López-Bosque, MJ
    Grácia, I
    Cané, C
    Wöllenstein, J
    Kühner, G
    Plescher, G
    Böttner, H
    [J]. IEEE SENSORS JOURNAL, 2004, 4 (02) : 195 - 206
  • [23] Advanced plasma processing combined with trench isolation technology for fabrication and fast prototyping of high aspect ratio MEMS in standard silicon wafers
    Sarajlic, E
    de Boer, MJ
    Jansen, HV
    Arnal, N
    Puech, M
    Krijnen, G
    Elwenspoek, M
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2004, 14 (09) : S70 - S75
  • [24] THE DESIGN, FABRICATION, AND TESTING OF CORRUGATED SILICON-NITRIDE DIAPHRAGMS
    SCHEEPER, PR
    OLTHUIS, W
    BERGVELD, P
    [J]. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1994, 3 (01) : 36 - 42
  • [25] SURFACE SEGREGATION IN SOME NON-IDEAL PLATINUM ALLOYS .1. PLATINUM TITANIUM-ALLOYS
    SPENCER, MS
    [J]. SURFACE SCIENCE, 1984, 145 (01) : 145 - 152
  • [26] PLANARIZATION AND FABRICATION OF BRIDGES ACROSS DEEP GROOVES OR HOLES IN SILICON USING A DRY FILM PHOTORESIST FOLLOWED BY AN ETCH BACK
    SPIERING, VL
    BERENSCHOT, JW
    ELWENSPOEK, M
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1995, 5 (02) : 189 - 192
  • [27] SACRIFICIAL WAFER BONDING FOR PLANARIZATION AFTER VERY DEEP-ETCHING
    SPIERING, VL
    BERENSCHOT, JW
    ELWENSPOEK, M
    FLUITMAN, JHJ
    [J]. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1995, 4 (03) : 151 - 157
  • [28] ON-CHIP DECOUPLING ZONE FOR PACKAGE-STRESS REDUCTION
    SPIERING, VL
    BOUWSTRA, S
    SPIERING, RMEJ
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 1993, 39 (02) : 149 - 156
  • [29] REALIZATION OF MECHANICAL DECOUPLING ZONES FOR PACKAGE-STRESS REDUCTION
    SPIERING, VL
    BOUWSTRA, S
    FLUITMAN, JHJ
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 1993, 37-8 : 800 - 804
  • [30] Micromachined reactors for catalytic partial oxidation reactions
    Srinivasan, R
    Hsing, IM
    Berger, PE
    Jensen, KF
    Firebaugh, SL
    Schmidt, MA
    Harold, MP
    Lerou, JJ
    Ryley, JF
    [J]. AICHE JOURNAL, 1997, 43 (11) : 3059 - 3069