Thermal stability of amorphous hard carbon films produced by cathodic arc deposition

被引：101

作者：

Anders, S ^{[1
]}

Diaz, J ^{[1
]}

Ager, JW ^{[1
]}

Lo, RY ^{[1
]}

Bogy, DB ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY, DEPT MECH ENGN, COMP MECH LAB, BERKELEY, CA 94720 USA

来源：

APPLIED PHYSICS LETTERS | 1997年 / 71卷 / 23期

关键词：

D O I：

10.1063/1.120339

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The thermal stability of amorphous hard carbon films produced by cathodic are deposition was studied by near edge x-ray absorption fine structure (NEXAFS) spectroscopy, Raman spectroscopy, and nanoindentation evaluation. Pure carbon films of up to 85% sp(3) content were deposited using a pulsed biasing technique and annealed in ultrahigh vacuum up to 850 degrees C. NEXAFS spectra show no change in the film properties up to 700 degrees C, and a modification of the spectra for 800 and 850 degrees C, which indicate graphitization. Raman spectra show only a very slight change up to 850 degrees C. The nanoindentation data show no change in hardness and elastic modulus with annealing up to 850 degrees C. The study demonstrates the high thermal stability of the films. The difference in the NEXAFS and the Raman and nanoindentation results can be attributed to the surface sensitivity of NEXAFS in comparison to the more bulk sensitivity of Raman spectroscopy and nanoindentation. (C) 1997 American Institute of Physics.

引用

页码：3367 / 3369

页数：3

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