High-performance, spin-coated zinc tin oxide thin-film transistors

被引:174
作者
Chang, Y. -J. [1 ]
Lee, D. -H.
Herman, G. S.
Chang, C. -H.
机构
[1] Oregon State Univ, Dept Chem Engn, Corvallis, OR 97331 USA
[2] Hewlett Packard Corp, Corvallis, OR USA
关键词
D O I
10.1149/1.2666588
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We have developed a general and low-cost, solution-based process that is suitable for the deposition of transparent conducting oxides through spin-coating or inkjet printing under ambient conditions. Highly transparent (similar to 95% in the visible portion) zinc tin oxide semiconducting thin films were deposited by spin coating. The deposited films were found to be smooth and uniform with an amorphous structure. Enhancement-mode metal-insulator-semiconductor field-effect transistors were fabricated showing a field-effect mobility (mu(FE)) as high as 16 cm(2)/V s, a turn-on voltage of 2 V, a current on-to-off ratio greater than 10(5), and a high on-current of 2.25 mA. (c) 2007 The Electrochemical Society.
引用
收藏
页码:H135 / H138
页数:4
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