A liquid-xenon-jet laser-plasma X-ray and EUV source

被引：51

作者：

Hansson, BAM ^{[1
]}

Rymell, L ^{[1
]}

Berglund, M ^{[1
]}

Hertz, HM ^{[1
]}

机构：

[1] Royal Inst Technol, SE-10044 Stockholm, Sweden

来源：

MICROELECTRONIC ENGINEERING | 2000年 / 53卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(00)00401-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector.

引用

页码：667 / 670

页数：4

共 20 条

[1] EUCLIDES, the European EUVL program [J].

Benschop, JPH ;

Kaiser, WM ;

Ockwell, DC .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :246-252

[2] Cryogenic liquid-jet target for debris-free laser-plasma soft x-ray generation [J].

Berglund, M ;

Rymell, L ;

Hertz, HM ;

Wilhein, T .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (06) :2361-2364

[3] Particle emission debris from a KrF laser-plasma x-ray source [J].

Bobkowski, R ;

Fedosejevs, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (04) :1973-1980

[4] HIGHLY IONIZED XENON SPECTRA (95-260-A) EXCITED IN TFR TOKAMAK PLASMAS [J].

BRETON, C ;

DEMICHELIS, C ;

HECQ, W ;

MATTIOLI, M ;

RAMETTE, J ;

SAOUTIC, B ;

BAUCHEARNOULT, C ;

BAUCHE, J ;

WYART, JF .

PHYSICA SCRIPTA, 1988, 37 (01) :33-37

[5]

Fiedorowicz H, 1995, P SOC PHOTO-OPT INS, V2523, P60, DOI 10.1117/12.220997

[6]

FIEDOROWICZ H, 1993, INST PHYS CONF SER, P515

[7] Sub-100-nm lithographic imaging with an EUV 10x microstepper [J].

Goldsmith, JEM ;

Berger, KW ;

Bozman, DR ;

Cardinale, GF ;

Folk, DR ;

Henderson, CC ;

O'Connell, DJ ;

Ray-Chaudhuri, AK ;

Stewart, KD ;

Tichenor, DA ;

Chapman, HN ;

Gaughan, R ;

Hudyma, RM ;

Montcalm, C ;

Spiller, EA ;

Taylor, JS ;

Williams, JD ;

Goldberg, KA ;

Gullikson, EM ;

Naulleau, P ;

Cobb, JL .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :264-271

[8] Scale-up of a cluster jet laser plasma source for Extreme Ultraviolet Lithography [J].

Kubiak, GD ;

Bernardez, LJ ;

Krenz, K ;

Sweatt, WC .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :669-678

[9]

KUBIAK GD, 1995, OSA P, V21, P248

[10]

KUBIAK GD, 1996, OSA TRENDS OPTICS PH, V4, P66

← 1 2 →