Fabrication and performance of parallel-addressed InGaN micro-LED arrays

被引:64
作者
Choi, HW [1 ]
Jeon, CW
Dawson, MD
Edwards, PR
Martin, RW
机构
[1] Univ Strathclyde, Inst Photon, Glasgow G4 0NW, Lanark, Scotland
[2] Univ Strathclyde, Dept Phys, Glasgow G4 0NG, Lanark, Scotland
关键词
gallium nitride; light-emitting diode (LED) arrays; micro-light-emitting diodes;
D O I
10.1109/LPT.2003.809257
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-performance, two-dimensional arrays of parallel-addressed InGaN blue micro-light-emitting diodes (LEDs) with individual element diameters of 8, 12, and 20 mum, respectively, and overall dimensions 490 x 490 mum, have been fabricated. In order to overcome the difficulty of interconnecting multiple device elements with sufficient step-height coverage for contact metallization, a novel scheme involving the etching of sloped-side-walls has. been developed. The devices have current-voltage (I-V) characteristics approaching those of broad-area reference LEDs fabricated from the same wafer, and give comparable (3-mW) light output in the forward direction to the reference LEDs, despite much lower active area. The external efficiencies of the micro-LED arrays improve as the dimensions of the individual elements are scaled down. This is attributed to scattering, at the etched sidewalls of in-plane propagating photons into the forward direction.
引用
收藏
页码:510 / 512
页数:3
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