共 15 条
Ferroelectric and paraelectric Ba0.5Sr0.5TiO3 film structure distortions at room temperature and their effects on tunable microwave properties
被引:24
作者:

Alldredge, L. M. B.
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Chang, Wontae
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Qadri, Syed B.
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Kirchoefer, Steven W.
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Pond, Jeffrey M.
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA
机构:
[1] USN, Res Lab, Washington, DC 20375 USA
关键词:
D O I:
10.1063/1.2741610
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Sputter-deposited Ba0.5Sr0.5TiO3 films on (001) MgO were characterized for their dielectric properties with different lattice structures. With varying Ar:O-2 ratios during deposition, the films showed either in-plane (c < a) or out-of-plane (c>a) tetragonal distortions, significantly affecting the dielectric constant and tunability. The dielectric constant exhibited clear hysteresis with dc bias at room temperature, indicating that the films were ferroelectric. The relationship between the dielectric properties and the distortions was the reverse of that observed in films deposited by pulsed laser deposition. The anisotropic in-plane dielectric behavior can be understood by relating polarization to film distortions and to the presence of permanent dipoles. (c) 2007 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 15 条
[1]
Science and technology of high dielectric constant thin films and materials integration for application to high frequency devices
[J].
Auciello, O
;
Saha, S
;
Kaufman, DY
;
Streiffer, SK
;
Fan, W
;
Kabius, B
;
Im, J
;
Baumann, P
.
JOURNAL OF ELECTROCERAMICS,
2004, 12 (1-2)
:119-131

Auciello, O
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Saha, S
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Kaufman, DY
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Streiffer, SK
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Fan, W
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Kabius, B
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Im, J
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

Baumann, P
论文数: 0 引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[2]
Optimization of the tunability of barium strontium titanate films via epitaxial stresses
[J].
Ban, ZG
;
Alpay, SP
.
JOURNAL OF APPLIED PHYSICS,
2003, 93 (01)
:504-511

Ban, ZG
论文数: 0 引用数: 0
h-index: 0
机构: Univ Connecticut, Dept Met & Mat Engn, Storrs, CT 06269 USA

Alpay, SP
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Connecticut, Dept Met & Mat Engn, Storrs, CT 06269 USA Univ Connecticut, Dept Met & Mat Engn, Storrs, CT 06269 USA
[3]
Directionally dependent ferroelectric phase transition order of anisotropic epitaxial BaxSr1-xTiO3 thin films -: art. no. 012902
[J].
Bellotti, JA
;
Chang, WT
;
Qadri, SB
;
Kirchoefer, SW
;
Pond, JM
.
APPLIED PHYSICS LETTERS,
2006, 88 (01)

Bellotti, JA
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Chang, WT
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Qadri, SB
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Kirchoefer, SW
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Pond, JM
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA
[4]
The effect of annealing on the microwave properties of Ba0.5Sr0.5TiO3 thin films
[J].
Chang, WT
;
Horwitz, JS
;
Carter, AC
;
Pond, JM
;
Kirchoefer, SW
;
Gilmore, CM
;
Chrisey, DB
.
APPLIED PHYSICS LETTERS,
1999, 74 (07)
:1033-1035

Chang, WT
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Horwitz, JS
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Carter, AC
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Pond, JM
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Kirchoefer, SW
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Gilmore, CM
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA

Chrisey, DB
论文数: 0 引用数: 0
h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USA USN, Res Lab, Washington, DC 20375 USA
[5]
Influence of strain on microwave dielectric properties of (Ba,Sr)TiO3 thin films
[J].
Chang, WT
;
Gilmore, CM
;
Kim, WJ
;
Pond, JM
;
Kirchoefer, SW
;
Qadri, SB
;
Chirsey, DB
;
Horwitz, JS
.
JOURNAL OF APPLIED PHYSICS,
2000, 87 (06)
:3044-3049

Chang, WT
论文数: 0 引用数: 0
h-index: 0
机构:
George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Gilmore, CM
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Kim, WJ
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Pond, JM
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Kirchoefer, SW
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Qadri, SB
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Chirsey, DB
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA

Horwitz, JS
论文数: 0 引用数: 0
h-index: 0
机构: George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
[6]
Low dielectric loss and enhanced tunability of Ba0.6Sr0.4TiO3 based thin films via material compositional design and optimized film processing methods
[J].
Cole, MW
;
Nothwang, WD
;
Hubbard, C
;
Ngo, E
;
Ervin, M
.
JOURNAL OF APPLIED PHYSICS,
2003, 93 (11)
:9218-9225

Cole, MW
论文数: 0 引用数: 0
h-index: 0
机构:
USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA

Nothwang, WD
论文数: 0 引用数: 0
h-index: 0
机构:
USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA

Hubbard, C
论文数: 0 引用数: 0
h-index: 0
机构:
USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA

Ngo, E
论文数: 0 引用数: 0
h-index: 0
机构:
USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA

Ervin, M
论文数: 0 引用数: 0
h-index: 0
机构:
USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA USA, Res Lab, Weap & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA
[7]
THEORY OF FERROELECTRICS
[J].
DEVONSHIRE, AF
.
ADVANCES IN PHYSICS,
1954, 3 (10)
:85-130

DEVONSHIRE, AF
论文数: 0 引用数: 0
h-index: 0
[8]
CAD models for multilayered substrate interdigital capacitors
[J].
Gevorgian, SS
;
Martinsson, T
;
Linner, PLJ
;
Kollberg, EL
.
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES,
1996, 44 (06)
:896-904

Gevorgian, SS
论文数: 0 引用数: 0
h-index: 0
机构: Department of Microwave Technology, Chalmers University of Technology, Gothenhurg

Martinsson, T
论文数: 0 引用数: 0
h-index: 0
机构: Department of Microwave Technology, Chalmers University of Technology, Gothenhurg

Linner, PLJ
论文数: 0 引用数: 0
h-index: 0
机构: Department of Microwave Technology, Chalmers University of Technology, Gothenhurg

Kollberg, EL
论文数: 0 引用数: 0
h-index: 0
机构: Department of Microwave Technology, Chalmers University of Technology, Gothenhurg
[9]
Microwave dielectric properties of strained (Ba0.4Sr0.6)TiO3 thin films
[J].
Kim, WJ
;
Wu, HD
;
Chang, W
;
Qadri, SB
;
Pond, JM
;
Kirchoefer, SW
;
Chrisey, DB
;
Horwitz, JS
.
JOURNAL OF APPLIED PHYSICS,
2000, 88 (09)
:5448-5451

Kim, WJ
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Wu, HD
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Chang, W
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Qadri, SB
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Pond, JM
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Kirchoefer, SW
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Chrisey, DB
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Horwitz, JS
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA
[10]
Microwave properties of tetragonally distorted (Ba0.5Sr0.5)TiO3 thin films
[J].
Kim, WJ
;
Chang, W
;
Qadri, SB
;
Pond, JM
;
Kirchoefer, SW
;
Chrisey, DB
;
Horwitz, JS
.
APPLIED PHYSICS LETTERS,
2000, 76 (09)
:1185-1187

Kim, WJ
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Chang, W
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Qadri, SB
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Pond, JM
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Kirchoefer, SW
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Chrisey, DB
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA

Horwitz, JS
论文数: 0 引用数: 0
h-index: 0
机构: SFA Inc, Largo, MD 20774 USA