Surface stress model for intrinsic stresses in thin films

被引：203

作者：

Cammarata, RC ^{[1
]}

Trimble, TM

Srolovitz, DJ

机构：

[1] Johns Hopkins Univ, Dept Mat Sci & Engn, Baltimore, MD 21218 USA

[2] Univ Maryland, Dept Phys & Astron, College Pk, MD 20742 USA

[3] Princeton Univ, Princeton Mat Inst, Princeton, NJ 08544 USA

[4] Princeton Univ, Dept Mech & Aerosp Engn, Princeton, NJ 08544 USA

来源：

JOURNAL OF MATERIALS RESEARCH | 2000年 / 15卷 / 11期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1557/JMR.2000.0354

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A simple model was presented for intrinsic stress generation in thin films resulting from surface stress effects. This mechanism can explain the origin of compressive stresses often observed during island growth prior to coalescence, as well as intrinsic compressive stresses reported for certain continuous, fully grown films. In some cases, surface stress effects may contribute to a sudden change in the intrinsic stress during island coalescence.

引用

页码：2468 / 2474

页数：7

共 44 条

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