In situ growth of SrTiO3 thin films prepared by AACVD from strontium and titanium oxide bisdipivaloylmethanates

被引：13

作者：

Pena, J

Martinez, A

Conde, F

Gonzalez-Calbet, JM

Vallet-Regi, M ^{[1
]}

机构：

[1] Univ Complutense, Fac Farm, Dept Quim Inorgan & Bioinorgan, E-28040 Madrid, Spain

[2] UCM, RENFE, Inst Magnetismo Aplicado, Madrid 28230, Spain

[3] Univ Complutense Madrid, Fac Ciencias Quim, Dept Quim Inorgan, E-28040 Madrid, Spain

来源：

SOLID STATE IONICS | 1997年 / 101卷

关键词：

AAMOCVD (aerosol-assisted chemical vapor deposition); buffer layers; thin films;

D O I：

10.1016/S0167-2738(97)00336-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Single phase SrTiO3 thin films were prepared from strontium and titanium oxide bisdipivaloylmethanate (dpm) by a MOCVD-derived spray pyrolysis method. First, the deposition behaviour of SrO-SrCO3 films obtained from Sr(dpm)(2) and that of TiO2 films from TiO(dpm)(2) were separately studied, in order to optimize the conditions to deposit SrTiO3 films. The films were deposited in a wide temperature range (600-900 degrees C) onto different substrates and characterized by X-ray powder diffraction, scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS).

引用

页码：183 / 190

页数：8

共 21 条

[1] ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED RADIO-FREQUENCY-SPUTTERED STRONTIUM-TITANATE THIN-FILMS [J].