Chemical vapour deposition of crystalline thin films of tantalum phosphide

被引：8

作者：

Blackman, CS

Carmalt, CJ

Parkin, IP

O'Neill, SA

Molloy, KC

Apostolico, L

机构：

[1] UCL, Dept Chem, London WC1H 0AJ, England

[2] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England

来源：

MATERIALS LETTERS | 2003年 / 57卷 / 18期

关键词：

chemical vapour deposition; thin film; tantalum phosphide; barrier layer; hard; chemical resistance;

D O I：

10.1016/S0167-577X(02)01341-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl(5) and PH(2)Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.

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页码：2634 / 2636

页数：3

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