Susceptor effects on the morphological and impurity properties of 4H-SiC epilayers

被引:12
作者
Landini, BE [1 ]
机构
[1] ATMI Inc, Danbury, CT 06810 USA
基金
美国国家航空航天局;
关键词
silicon carbide; epitaxy; susceptor; metal carbide;
D O I
10.1007/s11664-000-0082-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The morphological and impurity properties of 4H-SiC epilayers grown using graphite susceptors coated with vitreous carbon, SiC, TaC, and NbC were compared. Metal carbide coated susceptors produced epilayers with smooth morphologies and no thick backside polycrystalline SiC deposition. Epilayers grown using metal carbide coated susceptors possessed more than 10 times higher intentional N-2 doping efficiencies and more than 10 times lower unintentional Al concentrations compared to epilayers grown using vitreous carbon coated susceptors. Metal carbide coated susceptors permitted doping control and abrupt p.n. junctions, and possessed more than 10 times longer lifetimes compared with vitreous carbon or SiC coated susceptors.
引用
收藏
页码:384 / 390
页数:7
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