We report studies on nanoscale resistive memory devices that exhibit diodelike I-V characteristics at on-state with reverse bias current suppressed to below 10(-13) A and rectifying ratio >10(6). The intrinsic diodelike characteristics are robust during device operation and can survive >10(8) write/erase programming cycles. The devices can be programmed at reduced programming voltages compared to earlier studies without the initial high-voltage forming process. Multibit storage capability was also reported. The intrinsic diode characteristics provide a possible solution to suppress crosstalk in high-density crossbar memory or logic arrays particularly for those based on bipolar resistive switches (memristors).
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Sun I.
;
Lee, Chang B.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Lee, Chang B.
;
Yin, Huaxiang
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Yin, Huaxiang
;
Ahn, Seung-Eon
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Ahn, Seung-Eon
;
Kang, Bo S.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kang, Bo S.
;
Kim, Ki H.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Ki H.
;
Park, Jae C.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Park, Jae C.
;
Kim, Chang J.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Chang J.
;
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Song, Ihun
;
Kim, Sang W.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Sang W.
;
Stefanovich, Genrikh
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Stefanovich, Genrikh
;
Lee, Jung H.
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Samsung Adv Inst Technol, Nano Fabricat Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Lee, Jung H.
;
Chung, Seok J.
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Samsung Adv Inst Technol, Nano Fabricat Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Chung, Seok J.
;
Kim, Yeon H.
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Samsung Adv Inst Technol, Nano Fabricat Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Yeon H.
;
Park, Youngsoo
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Sun I.
;
Lee, Chang B.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Lee, Chang B.
;
Yin, Huaxiang
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Yin, Huaxiang
;
Ahn, Seung-Eon
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Ahn, Seung-Eon
;
Kang, Bo S.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kang, Bo S.
;
Kim, Ki H.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Ki H.
;
Park, Jae C.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Park, Jae C.
;
Kim, Chang J.
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Chang J.
;
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Song, Ihun
;
Kim, Sang W.
论文数: 0引用数: 0
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Sang W.
;
Stefanovich, Genrikh
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Stefanovich, Genrikh
;
Lee, Jung H.
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h-index: 0
机构:
Samsung Adv Inst Technol, Nano Fabricat Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Lee, Jung H.
;
Chung, Seok J.
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h-index: 0
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Samsung Adv Inst Technol, Nano Fabricat Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Chung, Seok J.
;
Kim, Yeon H.
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Samsung Adv Inst Technol, Nano Fabricat Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea
Kim, Yeon H.
;
Park, Youngsoo
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h-index: 0
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Samsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South KoreaSamsung Adv Inst Technol, Oxide Device Grp, Gyeonggi Do 449711, South Korea