EXPERIMENT ON THE ABSOLUTE MEASUREMENT OF A SILICON LATTICE SPACING AT THE NRLM

被引：12

作者：

TANAKA, M

NAKAYAMA, K

KURODA, K

机构：

来源：

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT | 1989年 / 38卷 / 02期

关键词：

D O I：

10.1109/19.192273

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：206 / 209

页数：4

共 12 条

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IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1989, 38 (02) :210-216

[2] ABSOLUTE MEASUREMENT OF THE (220)-LATTICE PLANE SPACING IN A SILICON CRYSTAL [J].

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[4]

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[6] POLISHING A 1-KG SILICON SPHERE FOR A DENSITY STANDARD [J].

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[7]

NAKAYAMA K, 1982, B NRLM, V31, P148

[8] TOWARD THE AVOGADRO CONSTANT - PRELIMINARY-RESULTS ON THE MOLAR VOLUME OF SILICON [J].

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PEUTO, AM ;

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IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1989, 38 (02) :200-205

[9] THE AVOGADRO CONSTANT - RECENT RESULTS ON THE MOLAR VOLUME OF SILICON [J].

SEYFRIED, P ;

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SACCONI, A .

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1987, 36 (02) :161-165

[10] A NEW OPTICAL INTERFEROMETER FOR ABSOLUTE MEASUREMENT OF LINEAR DISPLACEMENT IN THE SUBNANOMETER RANGE [J].

TANAKA, M ;

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L233-L235

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