LOW-TEMPERATURE FORMATION OF NISI2 FROM EVAPORATED SILICON

被引：51

作者：

LIEN, CD ^{[1
]}

NICOLET, MA ^{[1
]}

LAU, SS ^{[1
]}

机构：

[1] UNIV CALIF SAN DIEGO,LA JOLLA,CA 92093

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 81卷 / 01期

关键词：

D O I：

10.1002/pssa.2210810111

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：123 / 128

页数：6

相关论文

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