DIFFUSION IN INTERMETALLIC COMPOUNDS WITH THE CAF2 STRUCTURE - A MARKER STUDY OF THE FORMATION OF NISI2 THIN-FILMS

被引：123

作者：

DHEURLE, F

PETERSSON, S

STOLT, L

STRIZKER, B

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 08期

关键词：

D O I：

10.1063/1.331453

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：5678 / 5681

页数：4

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