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DIFFUSION OF NICKEL IN SILICON BELOW 475-DEGREES-C
被引:15
作者
:
BERNING, GLP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,DEPT PHYS,ROLLA,MO 65401
BERNING, GLP
LEVENSON, LL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,DEPT PHYS,ROLLA,MO 65401
LEVENSON, LL
机构
:
[1]
UNIV MISSOURI,DEPT PHYS,ROLLA,MO 65401
[2]
UNIV MISSOURI,GRAD CTR MAT RES,ROLLA,MO 65401
来源
:
THIN SOLID FILMS
|
1978年
/ 55卷
/ 03期
关键词
:
D O I
:
10.1016/0040-6090(78)90164-5
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:473 / 482
页数:10
相关论文
共 24 条
[1]
THE SOLID SOLUBILITY OF NICKEL IN SILICON DETERMINED BY NEUTRON ACTIVATION ANALYSIS
AALBERTS, JH
论文数:
0
引用数:
0
h-index:
0
AALBERTS, JH
VERHEIJKE, ML
论文数:
0
引用数:
0
h-index:
0
VERHEIJKE, ML
[J].
APPLIED PHYSICS LETTERS,
1962,
1
(01)
: 19
-
20
[2]
OBSERVATION OF PSEUDO-DIFFUSION OF NICKEL IN SINGLE-CRYSTAL SILICON BY IN-DEPTH AUGER-ELECTRON SPECTROSCOPY
BERNING, GLP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
BERNING, GLP
YOON, KH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
YOON, KH
LEWIS, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
LEWIS, G
SINHAROY, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
SINHAROY, S
LEVENSON, LL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
LEVENSON, LL
[J].
THIN SOLID FILMS,
1977,
45
(01)
: 141
-
145
[3]
DIFFUSION OF NICKEL IN SILICON
BONZEL, HP
论文数:
0
引用数:
0
h-index:
0
BONZEL, HP
[J].
PHYSICA STATUS SOLIDI,
1967,
20
(02):
: 493
-
&
[4]
CHANG CC, 1974, CHARACTERIZATION SOL
[5]
IDENTIFICATION OF DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION
CHU, WK
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CHU, WK
KRAUTLE, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
KRAUTLE, H
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MAYER, JW
MULLER, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MULLER, H
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
NICOLET, MA
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
TU, KN
[J].
APPLIED PHYSICS LETTERS,
1974,
25
(08)
: 454
-
457
[6]
PLATINUM SILICIDE FORMATION - ELECTRON-SPECTROSCOPY OF PLATINUM-PLATINUM SILICIDE INTERFACE
DANYLUK, S
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
DANYLUK, S
MCGUIRE, GE
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
MCGUIRE, GE
[J].
JOURNAL OF APPLIED PHYSICS,
1974,
45
(12)
: 5141
-
5144
[7]
FORMALISM FOR EXTRACTING DIFFUSION-COEFFICIENTS FROM CONCENTRATION PROFILES
HALL, PM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
HALL, PM
MORABITO, JM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
MORABITO, JM
[J].
SURFACE SCIENCE,
1976,
54
(01)
: 79
-
90
[8]
SOLID-SOLID REACTIONS IN PT-SI SYSTEMS
MUTA, H
论文数:
0
引用数:
0
h-index:
0
MUTA, H
SHINODA, D
论文数:
0
引用数:
0
h-index:
0
SHINODA, D
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(06)
: 2913
-
+
[9]
INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS
OLOWOLAFE, JO
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
OLOWOLAFE, JO
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
NICOLET, MA
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
MAYER, JW
[J].
THIN SOLID FILMS,
1976,
38
(02)
: 143
-
150
[10]
KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON
POATE, JM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
POATE, JM
TISONE, TC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
TISONE, TC
[J].
APPLIED PHYSICS LETTERS,
1974,
24
(08)
: 391
-
393
←
1
2
3
→
共 24 条
[1]
THE SOLID SOLUBILITY OF NICKEL IN SILICON DETERMINED BY NEUTRON ACTIVATION ANALYSIS
AALBERTS, JH
论文数:
0
引用数:
0
h-index:
0
AALBERTS, JH
VERHEIJKE, ML
论文数:
0
引用数:
0
h-index:
0
VERHEIJKE, ML
[J].
APPLIED PHYSICS LETTERS,
1962,
1
(01)
: 19
-
20
[2]
OBSERVATION OF PSEUDO-DIFFUSION OF NICKEL IN SINGLE-CRYSTAL SILICON BY IN-DEPTH AUGER-ELECTRON SPECTROSCOPY
BERNING, GLP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
BERNING, GLP
YOON, KH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
YOON, KH
LEWIS, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
LEWIS, G
SINHAROY, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
SINHAROY, S
LEVENSON, LL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MISSOURI,GRAD CTR MAT RES,DEPT PHYS,ROLLA,MO 65401
LEVENSON, LL
[J].
THIN SOLID FILMS,
1977,
45
(01)
: 141
-
145
[3]
DIFFUSION OF NICKEL IN SILICON
BONZEL, HP
论文数:
0
引用数:
0
h-index:
0
BONZEL, HP
[J].
PHYSICA STATUS SOLIDI,
1967,
20
(02):
: 493
-
&
[4]
CHANG CC, 1974, CHARACTERIZATION SOL
[5]
IDENTIFICATION OF DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION
CHU, WK
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CHU, WK
KRAUTLE, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
KRAUTLE, H
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MAYER, JW
MULLER, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MULLER, H
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
NICOLET, MA
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
TU, KN
[J].
APPLIED PHYSICS LETTERS,
1974,
25
(08)
: 454
-
457
[6]
PLATINUM SILICIDE FORMATION - ELECTRON-SPECTROSCOPY OF PLATINUM-PLATINUM SILICIDE INTERFACE
DANYLUK, S
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
DANYLUK, S
MCGUIRE, GE
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
TEXAS INSTR INC, POB 5012, DALLAS, TX 75222 USA
MCGUIRE, GE
[J].
JOURNAL OF APPLIED PHYSICS,
1974,
45
(12)
: 5141
-
5144
[7]
FORMALISM FOR EXTRACTING DIFFUSION-COEFFICIENTS FROM CONCENTRATION PROFILES
HALL, PM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
HALL, PM
MORABITO, JM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
BELL TEL LABS INC,555 UNION BLVD,ALLENTOWN,PA 18103
MORABITO, JM
[J].
SURFACE SCIENCE,
1976,
54
(01)
: 79
-
90
[8]
SOLID-SOLID REACTIONS IN PT-SI SYSTEMS
MUTA, H
论文数:
0
引用数:
0
h-index:
0
MUTA, H
SHINODA, D
论文数:
0
引用数:
0
h-index:
0
SHINODA, D
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(06)
: 2913
-
+
[9]
INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS
OLOWOLAFE, JO
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
OLOWOLAFE, JO
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
NICOLET, MA
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
MAYER, JW
[J].
THIN SOLID FILMS,
1976,
38
(02)
: 143
-
150
[10]
KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON
POATE, JM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
POATE, JM
TISONE, TC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
TISONE, TC
[J].
APPLIED PHYSICS LETTERS,
1974,
24
(08)
: 391
-
393
←
1
2
3
→