INHIBITION OF ACID ETCHING OF PT BY PRE-EXPOSURE TO OXYGEN PLASMA

被引：12

作者：

KIM, MJ

GRUENKE, LA

SAIA, RJ

COHEN, SS

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 04期

关键词：

D O I：

10.1063/1.94767

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：462 / 464

页数：3

共 12 条

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[3]

BLAVATNIK M, 1963, CORROSION, V19, P421

[4] CRYSTALLOGRAPHIC ANISOTROPIES IN ELECTROCHEMICAL ETCHING OF PT [J].

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SCHMIDT, LD .

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[5]

CHANG FT, 1935, Z PHYS CHEM, V33, P129

[6]

DHEURLE FM, 1982, FAL ECS M, P222

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CORROSION SCIENCE, 1966, 6 (02) :69-+

[8] EFFECT OF OXIDIZING AMBIENTS ON PLATINUM SILICIDE FORMATION .1. ELECTRON-MICROPROBE ANALYSIS [J].

KINGZETT, TJ ;

LADAS, CA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) :1729-1732

[9] ELECTROCHEMICAL CORROSION OF PLATINUM IN HYDROCHLORIC ACID SOLUTIONS [J].

LLOPIS, J ;

SANCHO, A .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (08) :720-726

[10] STRUCTURAL AND ELECTRICAL CHARACTERISTICS OF PLATINUM-SILICIDE-SILICON CONTACTS AS INFLUENCED BY SPUTTER ETCHING AND ANNEALING AMBIENT [J].

SEVERI, M ;

GABILLI, E ;

GUERRI, S ;

CELOTTI, G .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (05) :1998-2003

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