SILICIDES OF RUTHENIUM AND OSMIUM - THIN-FILM REACTIONS, DIFFUSION, NUCLEATION, AND STABILITY

被引：56

作者：

PETERSSON, CS ^{[1
]}

BAGLIN, JEE ^{[1
]}

DEMPSEY, JJ ^{[1
]}

DHEURLE, FM ^{[1
]}

LAPLACA, SJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1063/1.331319

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4866 / 4883

页数：18

共 50 条

[1] NUCLEATION-CONTROLLED THIN-FILM INTERACTIONS - SOME SILICIDES
ANDERSON, R
BAGLIN, J
DEMPSEY, J
HAMMER, W
DHEURLE, F
PETERSSON, S
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 285 - 287
[2] FORMATION OF NISI AND CURRENT TRANSPORT ACROSS NISI-SI INTERFACE
ANDREWS, JM
KOCH, FB
[J]. SOLID-STATE ELECTRONICS, 1971, 14 (10) : 901 - &
[3] ANGILELLO J, 1980, THIN FILM INTERFACES, P369
[4] ALTERNATIVE MARKER EXPERIMENT IN FORMATION OF MO AND W SILICIDES
BAGLIN, J
DHEURLE, F
PETERSSON, S
[J]. APPLIED PHYSICS LETTERS, 1978, 33 (04) : 289 - 290
[5] FORMATION OF SILICIDES IN MO-W BILAYER FILMS ON SI SUBSTRATES - MARKER EXPERIMENT
BAGLIN, J
DEMPSEY, J
HAMMER, W
DHEURLE, F
PETERSSON, S
SERRANO, C
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 641 - 661
[6] DIFFUSION MARKER EXPERIMENTS WITH RARE-EARTH SILICIDES AND GERMANIDES - RELATIVE MOBILITIES OF THE 2 ATOM SPECIES
BAGLIN, JEE
DHEURLE, FM
PETERSSON, CS
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2841 - 2846
[7] Baglin JEE, 1980, THIN FILM INTERFACES, P341
[8] BARRETT CS, 1952, STRUCTURE METALS, P647
[9] BORDERS JA, 1973, APPLICATIONS ION BEA, P179
[10] CANALI C, 1978, THIN FILM PHENOMENA, P38