LOW-ENERGY ION-BOMBARDMENT INDUCED ANISOTROPY IN SPUTTERED MOS2-X THIN-FILMS

被引：6

作者：

SUN, ZW ^{[1
]}

GRIBI, P ^{[1
]}

LEVY, F ^{[1
]}

机构：

[1] ECOLE POLYTECH FED,INST PHYS APPL,CH-1015 LAUSANNE,SWITZERLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1989年 / 22卷 / 08期

关键词：

D O I：

10.1088/0022-3727/22/8/029

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1210 / 1216

页数：7

共 23 条

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