CORRELATION BETWEEN PROCESS CONDITIONS, CHEMICAL-COMPOSITION AND MORPHOLOGY OF MOS2 FILMS PREPARED BY RF PLANAR MAGNETRON SPUTTERING

被引：47

作者：

BICHSEL, R ^{[1
]}

BUFFAT, P ^{[1
]}

LEVY, F ^{[1
]}

机构：

[1] ECOLE POLYTECH FED LAUSANNE,INST INTERDEPT MICROSCOPIE ELECTR,CH-1015 LAUSANNE,SWITZERLAND

来源：

关键词：

D O I：

10.1088/0022-3727/19/8/025

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1575 / 1585

页数：11

共 16 条

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[8] FUSARO RL, 1981, ASLE T, V25, P141
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