PREPARATION OF PBTIO3 FERROELECTRIC THIN-FILM BY CHEMICAL VAPOR-DEPOSITION

被引：28

作者：

NAKAGAWA, T ^{[1
]}

YAMAGUCHI, J ^{[1
]}

OKUYAMA, M ^{[1
]}

HAMAKAWA, Y ^{[1
]}

机构：

[1] OSAKA UNIV,DEPT ENGN SCI,TOYONAKA,OSAKA 560,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 10期

关键词：

D O I：

10.1143/JJAP.21.L655

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L655 / L656

页数：2

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共 6 条

[1] ION-BEAM DEPOSITION OF THIN-FILMS OF FERROELECTRIC LEAD ZIRCONATE TITANATE (PZT)
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[2] PREPARATION AND PROPERTIES OF FERROELECTRIC PLZT THIN-FILMS BY RF SPUTTERING
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[3] FERROELECTRIC PROPERTIES OF RF SPUTTERED PLZT THIN-FILM
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[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (05) : 897 - 902
[4] ELECTRICAL-PROPERTIES OF LEAD-ZIRCONATE-LEAD-TITANATE FERROELECTRIC THIN-FILMS AND THEIR COMPOSITION ANALYSIS BY AUGER-ELECTRON SPECTROSCOPY
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[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (08) : 4495 - 4499
[5] PREPARATION OF PBTIO3 FERROELECTRIC THIN-FILM BY RF SPUTTERING
OKUYAMA, M
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NAKANO, H
NAKAGAWA, T
HAMAKAWA, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (08) : 1633 - 1634
[6] FERROELECTRIC PLZT THIN-FILMS FABRICATED BY RF SPUTTERING
TANAKA, K
HIGUMA, Y
YOKOYAMA, K
NAKAGAWA, T
HAMAKAWA, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (07) : 1381 - 1382