PREPARATION AND PROPERTIES OF FERROELECTRIC PLZT THIN-FILMS BY RF SPUTTERING

被引：90

作者：

ISHIDA, M ^{[1
]}

MATSUNAMI, H ^{[1
]}

TANAKA, T ^{[1
]}

机构：

[1] KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 03期

关键词：

D O I：

10.1063/1.323714

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：951 / 953

页数：3

共 8 条

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CHAPMAN, DW .

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[2]

HAERTLING GH, 1971, J AM CERAM SOC, V54, P1, DOI [10.1111/j.1151-2916.1971.tb12296.x, 10.1111/j.1151-2916.1970.tb12105.x-i1]

[3]

Haertling GH, 1971, J AM CERAM SOC, V54, P303

[4]

MARTIN FW, 1965, PHYS CHEM GLASSES, V6, P143

[5] PREPARATION OF PLZT THIN-FILMS BY RF SPUTTERING [J].

MATSUNAMI, H ;

SUZUKI, M ;

ISHIDA, M ;

TANAKA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (06) :1163-1164

[6] PREPARATION OF THIN BATIO3 FILMS BY DC DIODE SPUTTERING [J].

SHINTANI, Y ;

TADA, O .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) :2376-&

[7] PREPARATION AND PROPERTIES OF EPITAXIAL FILMS OF FERROELECTRIC BI4TI3O12 [J].

TAKEI, WJ ;

FORMIGONI, NP ;

FRANCOMBE, MH .

APPLIED PHYSICS LETTERS, 1969, 15 (08) :256-+

[8] FERROELECTRIC PLZT THIN-FILMS FABRICATED BY RF SPUTTERING [J].

TANAKA, K ;

HIGUMA, Y ;

YOKOYAMA, K ;

NAKAGAWA, T ;

HAMAKAWA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (07) :1381-1382

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