ALUMINUM NITRIDE FILMS MADE BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION - PREPARATION AND PROPERTIES

被引：49

作者：

ROMAN, YG

ADRIAANSEN, APM

机构：

来源：

THIN SOLID FILMS | 1989年 / 169卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90707-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：241 / 248

页数：8

共 18 条

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[7] OPTICAL-PROPERTIES OF ALUMINUM OXYNITRIDES DEPOSITED BY LASER-ASSISTED CVD [J].

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[9] DEPOSITION OF ALN THIN-FILMS BY MAGNETRON REACTIVE SPUTTERING [J].

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[10]

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