IV CHARACTERISTICS OF PTSI-SI CONTACTS MADE FROM CVD PLATINUM

被引：25

作者：

RAND, MJ ^{[1
]}

机构：

[1] BELL TEL LABS INC,ALLENTOWN,PA 18103

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1975年 / 122卷 / 06期

关键词：

D O I：

10.1149/1.2134328

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：811 / 815

页数：5

共 10 条

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[7]

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[8] COMPOSITION PROFILES OF CVD PLATINUM AND PLATINUM SILICIDE BY AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY [J].

MORABITO, JM ;

RAND, MJ .

THIN SOLID FILMS, 1974, 22 (03) :293-303

[9] OBSERVATIONS ON FORMATION AND ETCHING OF PLATINUM SILICIDE [J].

RAND, MJ ;

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[10] CHEMICAL VAPOR-DEPOSITION OF THIN-FILM PLATINUM [J].

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