MECHANISMS OF BAND BENDING AT CSOX/GAAS(110) INTERFACES - INFLUENCE OF OVERLAYER STOICHIOMETRY AND INTERFACIAL REACTIVITY

被引:8
作者
PRIETSCH, M
DOMKE, M
LAUBSCHAT, C
REMMERS, G
WESCHKE, E
MANDEL, T
ORTEGA, JE
KAINDL, G
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 04期
关键词
D O I
10.1116/1.584591
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:986 / 990
页数:5
相关论文
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