BULK AND SURFACE CONDUCTION IN CVD SIO2 AND PSG PASSIVATION LAYERS

[11] KERN W, 1970, RCA REV, V31, P207

[12] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .2. FILM PROPERTIES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 568 - &

[13] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .1. DEPOSITION TECHNIQUES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 562 - &

[14] KERN W, 1968, RCA REV, V29, P525

[15] KERN W, 1975, AFMLTR75160 AIR FORC

[16] KERN W, 1975, JUN IEEE NAT AER EL

[17] STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5 [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) : 376 - &

[18] Koelmans H, 1974, 12TH ANN P REL PHYS, P168

[19] KOLESAR SC, 1974, 12TH ANN P REL PHYS, P155

[20] IONIC CONTAMINATION AND TRANSPORT OF MOBILE IONS IN MOS STRUCTURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (06) : 966 - +

[11] KERN W, 1970, RCA REV, V31, P207

[12] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .2. FILM PROPERTIES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 568 - &

[13] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .1. DEPOSITION TECHNIQUES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 562 - &

[14] KERN W, 1968, RCA REV, V29, P525

[15] KERN W, 1975, AFMLTR75160 AIR FORC

[16] KERN W, 1975, JUN IEEE NAT AER EL

[17] STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5 [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) : 376 - &

[18] Koelmans H, 1974, 12TH ANN P REL PHYS, P168

[19] KOLESAR SC, 1974, 12TH ANN P REL PHYS, P155

[20] IONIC CONTAMINATION AND TRANSPORT OF MOBILE IONS IN MOS STRUCTURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (06) : 966 - +