COMPOSITION ANALYSIS OF THIN ALXGA1-XAS LAYERS WITH TEM AND SIMS

被引:16
作者
DEJONG, AF
JANSSEN, KTF
机构
[1] Philips Research Laboratories WY2, JA Eindhoven, 5600
关键词
D O I
10.1557/JMR.1990.0578
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper two methods for measuring aluminum compositions in very thin (1.5-15 nm), individual ALxGa1-xAs layers are investigated. The transmission electron microscopy (TEM) thickness-fringe method uses the bright-field extinction fringes from a small, cleaved 90° wedge imaged in a [100] orientation. By comparing calculated and experimental extinction fringes, compositions are determined with a sensitivity in x of 0.03, in layers with a thickness of 3.5 nm. With secondary ion mass spectrometry (SIMS), compositions in AhxGa1-xAs layers with a thickness of 15 nm are measured with an accuracy in x between 0.02 and 0.05. Thicker layers (1 μm) with a composition known from x-ray diffraction measurements are used as a reference for both methods. Subsequently, TEM results are compared with SIMS and the reference measurements. The overall agreement is good, but for 0.25 x 0.65, the values of x found by TEM are systematically 0.05 too low. Using the SIMS and reference measurements as a calibration, compositions can be determined by TEM with an accuracy between 0.03 (low x) and 0.05 (high x) in layers as thin as 1.5 nm. © 1990, Materials Research Society. All rights reserved.
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页码:578 / 586
页数:9
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