LOW-LOSS OPTICAL WAVE-GUIDES FABRICATED BY THERMAL NITRIDATION OF OXIDIZED SILICON

被引：28

作者：

ZELMON, DE ^{[1
]}

BOYD, JT ^{[1
]}

JACKSON, HE ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT PHYS,CINCINNATI,OH 45221

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 04期

关键词：

D O I：

10.1063/1.96161

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：353 / 355

页数：3

共 10 条

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[6]

KWAN H, 1983, J ELECTROCHEM SOC, V130, P1139

[7] LOW-LOSS INTEGRATED OPTICAL-WAVEGUIDES FABRICATED BY NITROGEN ION-IMPLANTATION [J].

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APPLIED PHYSICS LETTERS, 1983, 43 (06) :519-520

[8] SILICON-NITRIDE FILMS ON SILICON FOR OPTICAL-WAVEGUIDES [J].

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STREIFER, W .

APPLIED OPTICS, 1977, 16 (12) :3218-3222

[9] LOW-PRESSURE NITRIDED-OXIDE AS A THIN GATE DIELECTRIC FOR MOSFETS [J].

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[10] A LOW-SCATTERING GRADED-INDEX SIO2 PLANAR OPTICAL-WAVEGUIDE THERMALLY GROWN ON SILICON [J].

ZELMON, DE ;

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APPLIED PHYSICS LETTERS, 1983, 42 (07) :565-566

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