THE PLASMA-ENHANCED DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON

被引:5
作者
EASTON, BC
CHAPMAN, JA
HILL, OF
POWELL, MJ
机构
关键词
D O I
10.1016/0042-207X(84)90069-1
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:371 / 376
页数:6
相关论文
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