ION ASSISTED DEPOSITION OF THERMALLY EVAPORATED AG AND AL FILMS

被引：38

作者：

HWANGBO, CK

LINGG, LJ

LEHAN, JP

MACLEOD, HA

MAKOUS, JL

KIM, SY

机构：

[1] UNIV ARIZONA, DEPT PHYS, TUCSON, AZ 85721 USA

[2] PENN STATE UNIV, MAT RES LAB, UNIVERSITY PK, PA 16802 USA

来源：

关键词：

D O I：

10.1364/AO.28.002769

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2769 / 2778

页数：10

共 55 条

[1] EFFECT OF ION ASSISTED DEPOSITION ON OPTICAL SCATTER AND SURFACE MICROSTRUCTURE OF THIN-FILMS
ALJUMAILY, GA
MCNALLY, JJ
MCNEIL, JR
HERRMANN, WC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 651 - 655
[2] ALLEN TH, 1982, P SOC PHOTO-OPT INST, V325, P93, DOI 10.1117/12.933291
[3] Aspnes D. E., 1981, Proceedings of the Society of Photo-Optical Instrumentation Engineers, V276, P188
[4] OPTICAL-PROPERTIES OF AU - SAMPLE EFFECTS
ASPNES, DE
KINSBRON, E
BACON, DD
[J]. PHYSICAL REVIEW B, 1980, 21 (08) : 3290 - 3299
[5] OPTICAL-ABSORPTION IN VAPOR-QUENCHED ALUMINUM
BERNLAND, LG
HUNDERI, O
MYERS, HP
[J]. PHYSICAL REVIEW LETTERS, 1973, 31 (06) : 363 - 365
[6] USE OF SURFACE PLASMA-WAVES FOR DETERMINATION OF THE THICKNESS AND OPTICAL-CONSTANTS OF THIN METALLIC-FILMS
CHEN, WP
CHEN, JM
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1981, 71 (02) : 189 - 191
[7] Chopra K.L, 1969, THIN FILM PHENOMENA
[8] Chu W. K., 1978, BACKSCATTERING SPECT
[9] CONTACT SIZE EFFECTS ON VAN VANDERPAUW METHOD FOR RESISTIVITY AND HALL-COEFFICIENT MEASUREMENT
CHWANG, R
SMITH, BJ
CROWELL, CR
[J]. SOLID-STATE ELECTRONICS, 1974, 17 (12) : 1217 - 1227
[10] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION
CUOMO, JJ
HARPER, JME
GUARNIERI, CR
YEE, DS
ATTANASIO, LJ
ANGILELLO, J
WU, CT
HAMMOND, RH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 349 - 354