RELATIONSHIP BETWEEN ELECTRON SENSITIVITY AND CHEMICAL-STRUCTURE OF POLYMERS AS EB RESISTS .1. ELECTRON SENSITIVITY OF VARIOUS POLYAMIDES

被引：2

作者：

OGATA, N ^{[1
]}

SANUI, K ^{[1
]}

AZUMA, C ^{[1
]}

TANAKA, H ^{[1
]}

OGUCHI, K ^{[1
]}

NAKADA, T ^{[1
]}

TAKAHASHI, Y ^{[1
]}

机构：

[1] DAI NIPPON PRINTING CO LTD,KAMIFUKUOKA,SAITAMA 356,JAPAN

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1983年 / 28卷 / 02期

关键词：

D O I：

10.1002/app.1983.070280224

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：699 / 708

页数：10

共 7 条

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[4]

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[6] PGMA AS A HIGH-RESOLUTION, HIGH-SENSITIVITY NEGATIVE ELECTRON-BEAM RESIST [J].

TANIGUCHI, Y ;

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JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (06) :1143-1148

[7] LITHOGRAPHY AND RADIATION-CHEMISTRY OF EPOXY CONTAINING NEGATIVE ELECTRON RESISTS [J].

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