SEMICONDUCTOR CRYSTAL-GROWTH BY SPUTTER DEPOSITION

[1] ELECTRICAL AND STRUCTURAL-PROPERTIES OF THIN GOLD-FILMS OBTAINED BY VACUUM EVAPORATION AND SPUTTERING [J]. THIN SOLID FILMS, 1974, 24 (01) : 89 - 100

[2] EFFECT OF DEPOSITION PARAMETERS ON CRYSTALLINITY OF EVAPORATED GERMANIUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) : 4301 - &

[3] HETEROEPITAXY OF GERMANIUM THIN-FILMS ON SILICON BY ION SPUTTERING [J]. JOURNAL OF CRYSTAL GROWTH, 1974, 24 (OCT) : 298 - 301

[4] STEP MOTION OF GROWTH SURFACE IN INITIAL-STAGE OF SEMICONDUCTOR FILM EPITAXY WITH ION SPUTTERING [J]. THIN SOLID FILMS, 1974, 20 (01) : 1 - 10

[5] ALEKSANDROV LN, 1974, JAPAN J APPL PHYS S, V2, P609

[6] COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 257 - 278

[7] ION MICROPROBE MASS ANALYZER [J]. SCIENCE, 1972, 175 (4024) : 853 - +

[8] NONLINEAR EFFECTS IN HEAVY-ION SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (02) : 953 - 954

[9] ANDERSEN HH, 1974, 7TH P YUG S PHYS ION

[10] FORMATION OF THIN CU2S (CHALCOCITE) FILMS USING REACTIVE SPUTTERING TECHNIQUES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 212 - 215

[1] ELECTRICAL AND STRUCTURAL-PROPERTIES OF THIN GOLD-FILMS OBTAINED BY VACUUM EVAPORATION AND SPUTTERING [J]. THIN SOLID FILMS, 1974, 24 (01) : 89 - 100

[2] EFFECT OF DEPOSITION PARAMETERS ON CRYSTALLINITY OF EVAPORATED GERMANIUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) : 4301 - &

[3] HETEROEPITAXY OF GERMANIUM THIN-FILMS ON SILICON BY ION SPUTTERING [J]. JOURNAL OF CRYSTAL GROWTH, 1974, 24 (OCT) : 298 - 301

[4] STEP MOTION OF GROWTH SURFACE IN INITIAL-STAGE OF SEMICONDUCTOR FILM EPITAXY WITH ION SPUTTERING [J]. THIN SOLID FILMS, 1974, 20 (01) : 1 - 10

[5] ALEKSANDROV LN, 1974, JAPAN J APPL PHYS S, V2, P609

[6] COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 257 - 278

[7] ION MICROPROBE MASS ANALYZER [J]. SCIENCE, 1972, 175 (4024) : 853 - +

[8] NONLINEAR EFFECTS IN HEAVY-ION SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (02) : 953 - 954

[9] ANDERSEN HH, 1974, 7TH P YUG S PHYS ION

[10] FORMATION OF THIN CU2S (CHALCOCITE) FILMS USING REACTIVE SPUTTERING TECHNIQUES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 212 - 215