Effect of Post-Annealing on the Microstructure and Electrical Properties of PMN-PZT Films Prepared by Aerosol Deposition Process

被引:7
作者
Hahn, Byung-Dong [1 ]
Ko, Kwan-Ho [2 ]
Park, Dong-Soo [1 ]
Choi, Jong-Jin [1 ]
Yoon, Woon-Ha [1 ]
Park, Chan [2 ]
Kim, Doh-Yeon [3 ]
机构
[1] Korea Inst Machinery & Mat, Dept Future Technol, Gyeongnam 641010, South Korea
[2] Pukyong Natl Univ, Div Mat Sci & Engn, Busan 608739, South Korea
[3] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151742, South Korea
关键词
PMN-PZT films; Aerosol deposition process; Post-annealing process; Electrical Properties;
D O I
10.4191/kcers.2006.43.2.106
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
PMN-PZT films with thickness of 5 mu m were deposited on Pt/Ti/SiO2/Si substrate at room temperature using aerosol deposition process. The films showed fairly dense microstructure without any crack. XRD and TEM analysis revealed that the films consisted of randomly oriented nanocrystalline and amorphous phases. Post-annealing process was employed to induce crystallization and grain growth of the as-deposited films and to improve the electrical properties. The annealed film showed markedly improved electrical properties in comparison with as-deposited film. The film after annealing at 700 degrees C for 1 h exhibited the best electrical properties. Dielectric constant (epsilon(r)), remanent polarization (P-r) and piezoelectric constant (d(33)) were 1050, 13 mu C/cm(2) and 120 pC/N, respectively.
引用
收藏
页码:106 / 113
页数:8
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