学术探索
学术期刊
新闻热点
数据分析
智能评审

ON THE INCREASED SENSITIVITY OF X-RAY ROCKING CURVE MEASUREMENTS BY TRIPLE-CRYSTAL DIFFRACTOMETRY

被引：33
作者：
ZAUMSEIL, P
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1985年 / 91卷 / 01期
关键词：
D O I：
10.1002/pssa.2210910147
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：K31 / K33
页数：3
相关论文
共 4 条
[1]   EFFECT OF DIFFUSE-SCATTERING IN THE STRAIN PROFILE DETERMINATION BY DOUBLE CRYSTAL X-RAY-DIFFRACTION [J].
CEMBALI, F ;
SERVIDORI, M ;
GABILLI, E ;
LOTTI, R .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1985, 87 (01) :225-233
[2]   SEPARATE MEASUREMENTS OF DYNAMICAL AND KINEMATICAL X-RAY DIFFRACTIONS FROM SILICON-CRYSTALS WITH A TRIPLE CRYSTAL DIFFRACTOMETER [J].
IIDA, A ;
KOHRA, K .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 51 (02) :533-542
[3]   TRIPLE CRYSTAL DIFFRACTOMETER INVESTIGATIONS OF SILICON-CRYSTALS WITH DIFFERENT COLLIMATOR ANALYZER ARRANGEMENTS [J].
ZAUMSEIL, P ;
WINTER, U .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1982, 70 (02) :497-505
[4]   X-RAY TRIPLE-CRYSTAL DIFFRACTOMETER INVESTIGATION OF ARSENIC IMPLANTED SILICON AFTER PULSED LASER IRRADIATION [J].
ZAUMSEIL, P ;
WINTER, U ;
GALLER, R .
CRYSTAL RESEARCH AND TECHNOLOGY, 1984, 19 (05) :633-641
1