AUTOMATIC MONITORING OF DEPOSITION CONDITIONS DURING RF SPUTTERING OF DIELECTRIC MATERIALS

被引：3

作者：

PITT, CW ^{[1
]}

KIRK, IH ^{[1
]}

STEVENS, RJ ^{[1
]}

机构：

[1] UCL, DEPT ELECTR & ELECT ENGN, LONDON WC1E 7JE, ENGLAND

来源：

关键词：

D O I：

10.1016/0042-207X(75)90002-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：265 / 271

页数：7

共 8 条

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HENNINGSEN, T
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[2] CHENG YC, 1974, ELECTRON LETT, V10, P315, DOI 10.1049/el:19740249
[3] PRODUCTION AND ANNEALING OF COLOR CENTERS IN RF SPUTTERED SIO2 FILMS
HICKMOTT, TW
[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (06) : 2543 - &
[4] HOLLAND L., 1970, VACUUM DEPOSITION TH, P1600
[5] Macleod H., 2018, THIN FILM OPTICAL FI, V5th ed.
[6] Maissel L.I., 1970, HDB THIN FILM TECHNO
[7] RF SPUTTERED THIN-FILMS FOR INTEGRATED OPTICAL COMPONENTS
PITT, CW
GFELLER, FR
STEVENS, RJ
[J]. THIN SOLID FILMS, 1975, 26 (01) : 25 - 51
[8] SPUTTERED-GLASS OPTICAL WAVEGUIDES
PITT, CW
[J]. ELECTRONICS LETTERS, 1973, 9 (17) : 401 - 403