EFFECTS OF THERMAL HISTORY ON MICRODEFECT FORMATION IN CZOCHRALSKI SILICON-CRYSTALS

被引：28

作者：

SHIMANUKI, Y ^{[1
]}

FURUYA, H ^{[1
]}

SUZUKI, I ^{[1
]}

MURAI, K ^{[1
]}

机构：

[1] JAPAN SILICON CO LTD,NODA,CHIBA 278,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 12期

关键词：

D O I：

10.1143/JJAP.24.1594

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1594 / 1599

页数：6

共 9 条

[1]

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[4]

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[5]

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MATSUSHITA, Y ;

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[7] THERMALLY INDUCED MICRODEFECTS IN CZOCHRALSKI-GROWN SILICON-CRYSTALS [J].

MATSUSHITA, Y .

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[8] HETEROGENEOUS PRECIPITATION OF SILICON OXIDES IN SILICON [J].

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[9]

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