THE EFFECT OF RADIO-FREQUENCY SUBSTRATE BIASING IN THE DEPOSITION OF DIAMOND-LIKE CARBON-FILMS IN AN ELECTRON-CYCLOTRON RESONANCE DISCHARGE

被引:25
作者
PASTEL, PW
VARHUE, WJ
机构
[1] Department of Electrical Engineering, University of Vermont, Burlington
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词
D O I
10.1116/1.577589
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The density, optical band gap, and hydrogen content of diamond-like carbon films have been controllably varied by radio frequency (rf) substrate biasing in an electron cyclotron resonance (ECR) discharge of CH4 and CH4-H2. The density varied from 1.4 to 2.2 g/cm3, the optical band gap from 2.7 to 1.2 eV, and the atomic fraction of hydrogen from 50% to 5% as rf substrate bias increased. Optical emission spectroscopy was used to characterize the glow discharge and establish the conditions under which either deposition or etching could occur.
引用
收藏
页码:1129 / 1133
页数:5
相关论文
共 19 条
[1]  
ANGUS JC, 1986, PLASMA DEPOSITED THI
[2]   ELECTRONIC-PROPERTIES OF AMORPHOUS-CARBON FILMS [J].
BREDAS, JL ;
STREET, GB .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1985, 18 (21) :L651-L655
[3]   RF-PLASMA DEPOSITED AMORPHOUS HYDROGENATED HARD CARBON THIN-FILMS - PREPARATION, PROPERTIES, AND APPLICATIONS [J].
BUBENZER, A ;
DISCHLER, B ;
BRANDT, G ;
KOIDL, P .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4590-4595
[4]   OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].
COBURN, JW ;
CHEN, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136
[5]   DIAMOND AND DIAMONDLIKE FILMS - DEPOSITION PROCESSES AND PROPERTIES [J].
DESHPANDEY, CV ;
BUNSHAH, RF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :2294-2302
[6]  
DEVRIES RC, 1987, ANNU REV MATER SCI, V17, P161
[7]   OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS [J].
DREYFUS, RW ;
JASINSKI, JM ;
WALKUP, RE ;
SELWYN, GS .
PURE AND APPLIED CHEMISTRY, 1985, 57 (09) :1265-1276
[8]   GROWTH-MECHANISM OF VAPOR-DEPOSITED DIAMOND [J].
FRENKLACH, M ;
SPEAR, KE .
JOURNAL OF MATERIALS RESEARCH, 1988, 3 (01) :133-140
[9]   DEPOSITION OF CARBONACEOUS FILMS USING ECR PLASMA APPARATUS DEPOSITION OF COLORLESS, TRANSPARENT AND SEMICONDUCTING FILM FROM METHANE PLASMA [J].
FUJITA, T ;
MATSUMOTO, O .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (09) :2624-2629
[10]   OPTICAL TECHNIQUES IN PLASMA DIAGNOSTICS [J].
GOTTSCHO, RA ;
MILLER, TA .
PURE AND APPLIED CHEMISTRY, 1984, 56 (02) :189-208