INFRARED SPECTROSCOPIC STUDY OF THE CHEMISORPTION OF CF3 SPECIES ON SILICON

被引：6

作者：

BERMUDEZ, VM

机构：

[1] Naval Research Laboratory, Washington

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 25期

关键词：

D O I：

10.1063/1.109076

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Infrared reflection absorption spectroscopy, in conjunction with Auger electron spectroscopy, is used to study the initial adsorption of CF3 species (mainly CF3+ ions) on polycrystalline Si in a model etching environment. Only monofluorosilyl groups (SiF) are observed, with no indication of adsorbed SiF2, SiF3, or CF(x)(1 less-than-or-equal-to x less-than-or-equal-to 3). The SiF exists in one of two chemically distinct environments, depending on the coverage of coadsorbed carbon.

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页码：3297 / 3299

页数：3

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