SILICON OXYNITRIDE FILMS - ION-BOMBARDMENT EFFECTS, DEPTH PROFILES, AND IONIC POLARIZATION, STUDIED WITH THE AID OF THE AUGER PARAMETER

被引：38

作者：

RIVIERE, JC ^{[1
]}

CROSSLEY, JAA ^{[1
]}

SEXTON, BA ^{[1
]}

机构：

[1] CSIRO,DIV MAT SCI,CLAYTON,VIC 3168,AUSTRALIA

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 09期

关键词：

D O I：

10.1063/1.341237

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4585 / 4600

页数：16

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