DRY DEVELOPMENT OF ION-BEAM EXPOSED PMMA RESIST

被引：28

作者：

ADESIDA, I ^{[1
]}

CHINN, JD ^{[1
]}

RATHBUN, L ^{[1
]}

WOLF, ED ^{[1
]}

机构：

[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 02期

关键词：

D O I：

10.1116/1.571810

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：666 / 671

页数：6

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