REACTIVE HIGH-RATE DC SPUTTERING OF OXIDES

被引：46

作者：

SCHERER, M

WIRZ, P

机构：

来源：

THIN SOLID FILMS | 1984年 / 119卷 / 02期

关键词：

D O I：

10.1016/0040-6090(84)90535-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：203 / 209

页数：7

共 11 条

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[7] HIGH-RATE DEPOSITION OF TRANSPARENT CONDUCTING FILMS BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING OF CD2SN ALLOY [J].

MANIV, S ;

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[9]

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[10]

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