ULTRAVIOLET-LASER ABLATION AND ETCHING OF POLY(METHYL METHACRYLATE SENSITIZED WITH AN ORGANIC DOPANT

[1] WAVELENGTH DEPENDENCE OF THE EXCIMER LASER ETCHING CHARACTERISTICS OF A POLYMERIC RESIST [J]. APPLIED PHYSICS LETTERS, 1987, 50 (18) : 1286 - 1288

[2] Heller HJ., 1972, PURE APPL CHEM, V30, P145, DOI [10.1351/pac197230010145, DOI 10.1351/PAC197230010145]

[3] JELLINEK HH, 1968, MAKROMOL CHEM, V115, P89

[4] MASUHARA H, 1987, MACROMOLECULES, V20, P452

[5] Murahara M., 1983, Oyo Buturi, V52, P83

[6] MECHANISM OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE AT 193 AND 248 NM - LASER-INDUCED FLUORESCENCE ANALYSIS, CHEMICAL-ANALYSIS, AND DOPING STUDIES [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) : 785 - 791

[7] ABLATIVE PHOTODECOMPOSITION OF POLYMER-FILMS BY PULSED FAR-ULTRAVIOLET (193 NM) LASER-RADIATION - DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS [J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (10) : 2601 - 2609

[8] PHOTOCHEMICAL CLEAVAGE OF A POLYMERIC SOLID - DETAILS OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE) AT 193-NM AND 248-NM [J]. MACROMOLECULES, 1986, 19 (03) : 916 - 921

[9] ABLATION AND ETCHING OF POLYMETHYLMETHACRYLATE BY VERY SHORT (160 FS) ULTRAVIOLET (308 NM) LASER-PULSES [J]. APPLIED PHYSICS LETTERS, 1987, 51 (16) : 1285 - 1287

[10] EXCIMER LASER ETCHING OF POLYMERS [J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (11) : 3861 - 3867

[1] WAVELENGTH DEPENDENCE OF THE EXCIMER LASER ETCHING CHARACTERISTICS OF A POLYMERIC RESIST [J]. APPLIED PHYSICS LETTERS, 1987, 50 (18) : 1286 - 1288

[2] Heller HJ., 1972, PURE APPL CHEM, V30, P145, DOI [10.1351/pac197230010145, DOI 10.1351/PAC197230010145]

[3] JELLINEK HH, 1968, MAKROMOL CHEM, V115, P89

[4] MASUHARA H, 1987, MACROMOLECULES, V20, P452

[5] Murahara M., 1983, Oyo Buturi, V52, P83

[6] MECHANISM OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE AT 193 AND 248 NM - LASER-INDUCED FLUORESCENCE ANALYSIS, CHEMICAL-ANALYSIS, AND DOPING STUDIES [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) : 785 - 791

[7] ABLATIVE PHOTODECOMPOSITION OF POLYMER-FILMS BY PULSED FAR-ULTRAVIOLET (193 NM) LASER-RADIATION - DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS [J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (10) : 2601 - 2609

[8] PHOTOCHEMICAL CLEAVAGE OF A POLYMERIC SOLID - DETAILS OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE) AT 193-NM AND 248-NM [J]. MACROMOLECULES, 1986, 19 (03) : 916 - 921

[9] ABLATION AND ETCHING OF POLYMETHYLMETHACRYLATE BY VERY SHORT (160 FS) ULTRAVIOLET (308 NM) LASER-PULSES [J]. APPLIED PHYSICS LETTERS, 1987, 51 (16) : 1285 - 1287

[10] EXCIMER LASER ETCHING OF POLYMERS [J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (11) : 3861 - 3867