EXCIMER LASER ETCHING OF POLYMERS

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[2] THE OPTICAL-PROPERTIES OF KAPTON - MEASUREMENT AND APPLICATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3579 - 3582

[3] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[4] BRAREN B, 1985, J VAC SCI TECHNOL B, V31, P4077

[5] CONTACT LITHOGRAPHY AT 157 NM WITH AN F2 EXCIMER LASER [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1186 - 1189

[6] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7201 - 7204

[7] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J]. APPLIED PHYSICS LETTERS, 1984, 44 (09) : 849 - 851

[8] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 828 - 830

[9] THE THERMAL DEGRADATION OF POLYVINYL COMPOUNDS .3. THE EFFECT OF INHIBITORS AND END GROUPS ON THE DEGRADATION OF POLYMETHYL METHACRYLATE [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1949, 199 (1056): : 24 - 39

[10] RECENT DEVELOPMENTS IN 2-LEVEL RESIST TECHNOLOGY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1423 - 1428

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[2] THE OPTICAL-PROPERTIES OF KAPTON - MEASUREMENT AND APPLICATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3579 - 3582

[3] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[4] BRAREN B, 1985, J VAC SCI TECHNOL B, V31, P4077

[5] CONTACT LITHOGRAPHY AT 157 NM WITH AN F2 EXCIMER LASER [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1186 - 1189

[6] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7201 - 7204

[7] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J]. APPLIED PHYSICS LETTERS, 1984, 44 (09) : 849 - 851

[8] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 828 - 830

[9] THE THERMAL DEGRADATION OF POLYVINYL COMPOUNDS .3. THE EFFECT OF INHIBITORS AND END GROUPS ON THE DEGRADATION OF POLYMETHYL METHACRYLATE [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1949, 199 (1056): : 24 - 39

[10] RECENT DEVELOPMENTS IN 2-LEVEL RESIST TECHNOLOGY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1423 - 1428