PROPERTIES OF CR-N FILMS PRODUCED BY REACTIVE SPUTTERING

被引:30
作者
SHIH, KK
DOVE, DB
CROWE, JR
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词
D O I
10.1116/1.573887
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:564 / 567
页数:4
相关论文
共 5 条
[1]   CHARACTERIZATION OF THICK CHROMIUM-CARBON AND CHROMIUM-NITROGEN FILMS DEPOSITED BY HOLLOW-CATHODE DISCHARGE [J].
KOMIYA, S ;
ONO, S ;
UMEZU, N ;
NARUSAWA, T .
THIN SOLID FILMS, 1977, 45 (03) :433-445
[2]   PHYSICAL VAPOR-DEPOSITION OF THICK CR AND ITS CARBIDE AND NITRIDE FILMS BY HOLLOW-CATHODE DISCHARGE [J].
KOMIYA, S ;
TSURUOKA, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :520-524
[3]  
Maissel L.I., 1970, HDB THIN FILM TECHNO, P13
[4]   PHYSICAL VAPOR-DEPOSITION OF CHROMIUM AND TITANIUM NITRIDES BY HOLLOW-CATHODE DISCHARGE PROCESS [J].
SATO, T ;
TADA, M ;
HUANG, YC .
THIN SOLID FILMS, 1978, 54 (01) :61-65
[5]   THE DEVELOPMENT OF HIGH-PERFORMANCE, LOW-COST SOLAR-SELECTIVE ABSORBERS [J].
SIKKENS, M ;
VANHEEREVELD, AAMT ;
VOGELZANG, E ;
BOOSE, CA .
THIN SOLID FILMS, 1983, 108 (03) :229-238