PROPOSED METHOD FOR FABRICATING 50-NM-PERIOD GRATINGS BY ACHROMATIC HOLOGRAPHIC LITHOGRAPHY

被引：19

作者：

YEN, A

SCHATTENBURG, ML

SMITH, HI

机构：

[1] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139

[2] MIT,CTR SPACE RES,CAMBRIDGE,MA 02139

来源：

APPLIED OPTICS | 1992年 / 31卷 / 16期

关键词：

HOLOGRAPHY; LITHOGRAPHY; GRATING; X RAY; SOFT X RAY;

D O I：

10.1364/AO.31.002972

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A method for producing large-area, 50-nm-period gratings by using a grating-type interferometer and undulator radiation at 14 nm is described.

引用

页码：2972 / 2973

页数：2

共 19 条

[1] FABRICATION BY TRI-LEVEL ELECTRON BEAM LITHOGRAPHY OF X-RAY MASKS WITH 50nm LINEWIDTHS, AND REPLICATION BY X-RAY NANOLITHOGRAPHY.
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[5] REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M
BJORKHOLM, JE
BOKOR, J
EICHNER, L
FREEMAN, RR
GREGUS, J
JEWELL, TE
MANSFIELD, WM
MACDOWELL, AA
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[6] FABRICATION OF 50 NM LINE-AND-SPACE X-RAY MASKS IN THICK AU USING A 50 KEV ELECTRON-BEAM SYSTEM
CHU, W
SMITH, HI
RISHTON, SA
KERN, DP
SCHATTENBURG, ML
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 118 - 121
[7] REPLICATION OF 50-NM-LINEWIDTH DEVICE PATTERNS USING PROXIMITY X-RAY-LITHOGRAPHY AT LARGE GAPS
CHU, W
SMITH, HI
SCHATTENBURG, ML
[J]. APPLIED PHYSICS LETTERS, 1991, 59 (13) : 1641 - 1643
[8] CHU W, IN PRESS MICROELECTR
[9] GULLIKSON E, 1989, COMMUNICATION
[10] Henke B. L., 1982, Atomic Data and Nuclear Data Tables, V27, P1, DOI 10.1016/0092-640X(82)90002-X

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