BAND-EDGE EXCITON LUMINESCENCE FROM SI STRAINED SI1-XGEX/SI STRUCTURES

被引:8
作者
STURM, JC [1 ]
XIAO, X [1 ]
SCHWARTZ, PV [1 ]
LIU, CW [1 ]
LENCHYSHYN, LC [1 ]
THEWALT, MLW [1 ]
机构
[1] SIMON FRASER UNIV,DEPT PHYS,BURNABY V5A 1S6,BC,CANADA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 04期
关键词
D O I
10.1116/1.586174
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Well-resolved band-edge exciton photoluminescence has been observed in strained Si1-xGex, layers grown on Si(100) by rapid thermal chemical vapor deposition. The luminescence is due to shallow-impurity bound excitons at low temperatures (under 20 K) and is an excellent probe of quantum confinement effects in narrow quantum wells. At higher temperatures, the luminescence is due to free excitons or electron hole plasmas, depending on the pump power. Experiments with single and multiple quantum well structures indicate that most of the Si1-xGex, luminescence is from carriers which were generated in the silicon substrate and subsequently were trapped in the quantum wells.
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收藏
页码:1998 / 2001
页数:4
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