PLASMA ENHANCED BEAM DEPOSITION OF THIN-FILMS AT LOW-TEMPERATURES

[1] BOYD, 1982, J APPL PHYS, V53, P4166

[2] THE ACTIVATED REACTIVE EVAPORATION PROCESS - DEVELOPMENTS AND APPLICATIONS [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 255 - 261

[3] PLASMA ENHANCED BEAM DEPOSITION OF THIN DIELECTRIC FILMS [J]. APPLIED PHYSICS LETTERS, 1983, 42 (03) : 272 - 274

[4] PARAMETRICALLY INDUCED NONLINEAR WAVE-PARTICLE SCATTERING AND PLASMA-HEATING NEAR LOWER HYBRID FREQUENCY [J]. PHYSICAL REVIEW LETTERS, 1974, 32 (22) : 1227 - 1231

[5] MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 278 - 280

[6] DAUTREMONTSMITH WC, UNPUB

[7] HALL JT, 1978, SURF SCI, V76, P61

[8] HARPER ME, 1978, THIN FILM PROCESSES, P175

[9] HOLLAHAN JR, 1978, THIN FILM PROCESSES, P335

[10] KERN W, 1978, THIN FILM PROCESSES, P258

[1] BOYD, 1982, J APPL PHYS, V53, P4166

[2] THE ACTIVATED REACTIVE EVAPORATION PROCESS - DEVELOPMENTS AND APPLICATIONS [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 255 - 261

[3] PLASMA ENHANCED BEAM DEPOSITION OF THIN DIELECTRIC FILMS [J]. APPLIED PHYSICS LETTERS, 1983, 42 (03) : 272 - 274

[4] PARAMETRICALLY INDUCED NONLINEAR WAVE-PARTICLE SCATTERING AND PLASMA-HEATING NEAR LOWER HYBRID FREQUENCY [J]. PHYSICAL REVIEW LETTERS, 1974, 32 (22) : 1227 - 1231

[5] MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 278 - 280

[6] DAUTREMONTSMITH WC, UNPUB

[7] HALL JT, 1978, SURF SCI, V76, P61

[8] HARPER ME, 1978, THIN FILM PROCESSES, P175

[9] HOLLAHAN JR, 1978, THIN FILM PROCESSES, P335

[10] KERN W, 1978, THIN FILM PROCESSES, P258