TEMPERATURE-DEPENDENCE OF HOT-ELECTRON-INDUCED DEGRADATION IN MOSFETS

被引:65
作者
HSU, FC
CHIU, KY
机构
关键词
D O I
10.1109/EDL.1984.25865
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:148 / 150
页数:3
相关论文
共 12 条
  • [1] TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS
    CROWELL, CR
    SZE, SM
    [J]. APPLIED PHYSICS LETTERS, 1966, 9 (06) : 242 - &
  • [2] Hu C., 1983, International Electron Devices Meeting 1983. Technical Digest, P176
  • [3] KO PK, 1982, THESIS UC BERKELEY
  • [4] MATSUMOTO H, 1981, IEEE T ELECTRON DEV, V28, P923, DOI 10.1109/T-ED.1981.20460
  • [5] 1 MU-M MOSFET VLSI TECHNOLOGY .4. HOT-ELECTRON DESIGN CONSTRAINTS
    NING, TH
    COOK, PW
    DENNARD, RH
    OSBURN, CM
    SCHUSTER, SE
    YU, HN
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 346 - 353
  • [6] THE EFFECT OF TEMPERATURE ON HOT-ELECTRON TRAPPING IN MOSFETS
    SATOH, Y
    MIYAMOTO, K
    MATSUMOTO, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L221 - L222
  • [7] Sze S. M., 1981, PHYSICS SEMICONDUCTO, P30
  • [8] AN EMPIRICAL-MODEL FOR DEVICE DEGRADATION DUE TO HOT-CARRIER INJECTION
    TAKEDA, E
    SUZUKI, N
    [J]. IEEE ELECTRON DEVICE LETTERS, 1983, 4 (04) : 111 - 113
  • [9] CORRELATION BETWEEN SUBSTRATE AND GATE CURRENTS IN MOSFETS
    TAM, S
    KO, PK
    HU, CM
    MULLER, RS
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (11) : 1740 - 1744
  • [10] HOT-ELECTRON CURRENTS IN VERY SHORT CHANNEL MOSFETS
    TAM, S
    HSU, FC
    HU, C
    MULLER, RS
    KO, PK
    [J]. IEEE ELECTRON DEVICE LETTERS, 1983, 4 (07) : 249 - 251