AUTOMATIC POSITIONING OF DEVICE ELECTRODES USING SCANNING ELECTRON MICROSCOPE

[1] BAKISH R, 1962, INTRODUCTION ELEC ED, P374

[2] Broers A, 1965, MICROELECTRON RELIAB, V4, P103

[3] BROERS AN, 1965, THESIS CAMBRIDGE U

[4] FORMATION OF THIN FILM CIRCUITS USING PREFERENTIAL NUCLEATION [J]. SOLID-STATE ELECTRONICS, 1965, 8 (05) : 479 - &

[5] CLARK GL, 1961, ENCYCLOPEDIA MICR ED, P241

[6] SIMULTANEOUS OBSERVATION OF DIFFUSION-INDUCED DISLOCATION SLIP PATTERNS IN SI WITH ELECTRON BEAM SCANNING + OPTICAL MEANS [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2782 - &

[7] OBSERVATIONS OF INDIVIDUAL DISLOCATIONS AND OXYGEN PRECIPITATES IN SILICON WITH A SCANNING ELECTRON BEAM METHOD [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (04) : 1476 - &

[8] Evekhart T.E., 1959, J ELECT CONTROL, V7, P97, DOI 10.1080/00207215908937191

[9] NOVEL METHOD OF SEMICONDUCTOR DEVICE MEASUREMENTS [J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1642 - &

[10] EVALUATION OF PASSIVATED INTEGRATED CIRCUITS USING THE SCANNING ELECTRON MICROSCOPE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (08) : 929 - 936

[1] BAKISH R, 1962, INTRODUCTION ELEC ED, P374

[2] Broers A, 1965, MICROELECTRON RELIAB, V4, P103

[3] BROERS AN, 1965, THESIS CAMBRIDGE U

[4] FORMATION OF THIN FILM CIRCUITS USING PREFERENTIAL NUCLEATION [J]. SOLID-STATE ELECTRONICS, 1965, 8 (05) : 479 - &

[5] CLARK GL, 1961, ENCYCLOPEDIA MICR ED, P241

[6] SIMULTANEOUS OBSERVATION OF DIFFUSION-INDUCED DISLOCATION SLIP PATTERNS IN SI WITH ELECTRON BEAM SCANNING + OPTICAL MEANS [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2782 - &

[7] OBSERVATIONS OF INDIVIDUAL DISLOCATIONS AND OXYGEN PRECIPITATES IN SILICON WITH A SCANNING ELECTRON BEAM METHOD [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (04) : 1476 - &

[8] Evekhart T.E., 1959, J ELECT CONTROL, V7, P97, DOI 10.1080/00207215908937191

[9] NOVEL METHOD OF SEMICONDUCTOR DEVICE MEASUREMENTS [J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1642 - &

[10] EVALUATION OF PASSIVATED INTEGRATED CIRCUITS USING THE SCANNING ELECTRON MICROSCOPE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (08) : 929 - 936